

- We, FOI Group, are a high-tech venture company driven by engineers who hope to research & develop the next-generation semiconductor equipment and to master semiconductor manufacturing technology.
The semiconductor technology is a young technology that was born in the 20th century. By an always advanced revolution, it could bring to the reality personal computers, cellular phones, etc. The semiconductor technology has become a quasi unique way to support the humans of the present & the future time.
We manufacture machines which are used to fabricate the semiconductor devices.
We hope that we provide the latest machines with competitive price by all-out cost down and contribute to the achievement of computers & cell phones which people from all over the world can buy.
Semiconductor technology keeps developing without limit and the generation of 300mm & 45nm has come.
And even more, some advanced companies have already started getting in operating under the 32nm node.
In such background, we are inventing original plasma sources and are developing the machines which use these plasma technologies.
We have already commercialized and sold various systems for 300/200/150mm wafer size, such as etching system for oxide/Low-k films, light etching system, ashing system, and surface oxynitridation system
We hope that you will be interested in our FOI group's activity.

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- Activate the high-technology industry through the development of our company's business, and contribute to the development of Japanese society.
- Aim at the increase of the stock value, and fulfill our responsibility to stakeholder including the stockholder.
- Maintain employment levels, and achieve stable life of our employees and workplace worth working.
- Always keep advanced technology, and provide the total solution along customer satisfaction.
- Carry on stable customer service over the long run.

- Company Name
- FOI Corporation
- Address
- 1-1-10, Oyama, Chuou-ku, Sagamihara-city, Kanagawa 252-0205, Japan
042-700-3660 (TEL)
042-700-3020 (FAX)
- Date of Establishment
- October 17, 1994
- Capital
- 9,485,924,600 yen (as of November 20, 2009)
- Business
- Research and development of component technology for semiconductor manufacturing equipment, product development, manufacturing, and sales & maintenance services
- Representative Director
- Yutaka Okumura
Masakazu Uehata
- Employees
- 207 (Including overseas subsidiary, as of the end of December, 2009)
- Banks of Account
- Resona Holdings, Inc., Shibuya Branch
Development Bank of Japan, Head Office
The Bank of Yokohama, Ltd., Shinyurigaoka Branch
The Bank of Tokyo-Mitsubishi UFJ,Ltd., Machida Branch
Mizuho Bank, Ltd., Shinjuku Nishiguchi Branch
The Yachiyo Bank, Ltd., Sagamihara Branch
The Sumitomo Trust and Banking Co., Ltd., Tokyo Business Dept, etc.
- URL
- http://www.foi.co.jp/

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- GroovyICP plasma source
- Balanced-ICP plasma source
- Scorpio 300mm&450mm Platform
- 6 & 8 inch platform
- Cluster Tool Control System