• Etching System
  • STELLA is a high-end etching system for 300/200mm wafer, which uses Groovy ICP (FOI patents).


    Groovy ICP is the only one narrow gap ICP source in the world, and an epoch-making plasma source which has the advantages of both existing CCP source & ICP source.


    By using this Groovy ICP source, STELLA can be used for various etching processes such as HARC, Spacer, PAD, etc. and various materials such as High-k, Low-k, etc.


    STELLA has the innovative performance such as achievable etching rate from 2 micrometer/minute to 1 Angstrom/second (60 Angstrom/minute), because it has a wide process window and can span a wide-range of conditions.


    STELLA fully supports FA (GEM, GEM300).