• Surface Oxynitridation System
  • XORS is a surface oxynitridation system for 300mm silicon wafer, which has Balanced-ICP source using advanced technology of FOI.


    It can make oxynitridation film (average thickness under 20 Angstrom) and uniformity (0.5%~1.0%), by combining high density Balanced-ICP source with high-cleanliness process chamber & ceramic susceptor.


    You can greatly improve the yield by use of XORS into the Back-End-of-Line (BEOL) process of memory.


    XORS fully supports FA (GEM, GEM300).